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What is it? Silicon Nitride ? Silicon nitride can be described as an inorganic substance that has the chemical formula Si3N4. It is an important structural ceramic material, with high hardness and wear resistance. It is also resistant to heat and cold shocks. It can be heated to over 1000°C in the air. If it is quickly cooled, it will not break. This is because of the exceptional properties of silicon-nitride ceramics. It is used often to produce mechanical components, such as bearings. The heat-receiving area of engine components can be made from silicon nitride clays, which are heat-resistant and hard to heat transfer. This will not only increase the quality of the engines but also save fuel. Similar engines have been created in China and Japan.
Silicon Nitride’s main features
The relative molecular weight is 140.28. You can choose from grey, white, or off-white. It is high temperature insoluble, has no melting points, and is strong against high temperature creep. The melting point of reaction sintered silicone nitride is over 1800°C; hexagonal system. The crystals are hexahedral. Si3N4 prepared through reaction sintering methods has a density of 1.82.7g/cm3. Si3N4 prepared through hot pressing methods has a density of 3.123.22g/cm3. Mohs hardness 9.9, Vickers hardness 2.20, and microhardness 3.123.22g/cm3 are the Mohs hardness. Melting point 1900 (under pressure). Normal pressure usually causes it to decompose at around 1900degC. Specific heat capacity 0.71J/g*K The heat of forming is -751.57kJ/mol. The thermal conductivity of the material is (2-155) W/(m*K). The coefficient of linear expansion is 2.8~3.2×10-6/(20~1000). It is not soluble when water is used. Hydrofluoric Acid makes it soluble. The temperature at which oxygenation begins in the air is 1300-1400. The specific volume resistance of the air is 1.4×105 *m for 20degC, and 4×108 *m for 500degC. The elastic modulus measures 2842046060MPa. The reaction sintered results in a 490MPa compressive force. At 1285, it reacts to dicalcium dinitride, forming calcium silicide. And at 600, the transitional metal is reduced and nitrogen oxides released. It has a bending strength of 147MPa. It can be made by heating silicon powder with nitrogen or reacting silica halide in ammonia. The resistance is between 10 and 15 to 16 O.cm. Useful for high temperature ceramic raw materials.
Silicon Nitride Properties
Other Titles silicon (IV), nitride
No. 12033-89-5
Combination Formula Si3N4
Molecular Weight 140.28
Appearance White powder to gray powder
Melting Point 1900 degC
Boiling Point N/A
Density 2.2-3.5 g/cm3
Solubility of H2O Insoluble
Electrical Resistivity 11 to 12 10x O.m
Specific heat 720-800 J/kg K
Poisson’s Ratio 0.24 to $0.27
Thermal Conductivity 12 to 31 W/m/m-K
Thermal Expansion 2.5 to 3.0 um/m-K
Young’s Modulus 140 to 315 GPa
Exact Mass 139.943 g/mol
Silicon Nitride Si3N4 Powder CAS 12033-89-5
Silicon Nitride’s applications
1. High thermal stability, high oxidation resistance, high dimensional accuracy and strong thermal stability are all characteristics of silicon nitride ceramic material. Silicon nitride, a covalent chemical compound with high bond strengths and the ability to form an oxide protective coating in the air, has excellent chemical stability. It is resistant to oxidization and can be infiltrated or damaged by many molten metals and alloys, including aluminum, lead, zinc, silver, nickel, etc. But it can also be corroded from molten liquids, such as magnesium and nickel-chromium alliance, as well as stainless steel. Silicon nitride ceramic materials are used for high temperature engineering components, advanced materials in the metallurgical field, corrosion-resistant parts and sealing components in the chemical sector. They can also be used as cutting tools and tools in the machining industry.
Because silicon nitride forms strong bonds with aluminum oxide, silicon carbide, silicon carbide, thorium dioxide, boron and thorium dioxide it can be used to modify different ratios.
2. Also, solar cells can be made from silicon nitride. After the silicon-nitride coating is applied using the PECVD method it can be used as an antireflection film to reduce reflection of incident sunlight. During the deposition of the silicon silicon nitride movie, hydrogen atoms from the reaction product enter both the silicon film and the silicon wafer. This role was to prevent passivation. Here, the atomic ratio of silicon Nitride to silicon Nitride is not exactly 4:3. It fluctuates between different process conditions and different physical properties.
3. For ultra-high temperatures gas turbines, aircraft engines and electric furnaces.
Silicon Nitride is the main supplier
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