Introduction to Silicon Nitride si3N4 Powder
This is an inorganic compound, with the chemical formula Si3N4. The relative molecular mass of this substance is 140.28. Gray, white, or off-white.
Physicochemical properties of Silicon Nitride Si3N4 Pulp
Si3N4 has high-temperature insoluble properties. It exhibits high-temperature creep resistance. Hexagonal system. Crystals are hexagonal. The Si3N4 density obtained using the reaction sintering process is 1.8-2.7% g/cm3. The Si3N4 density obtained via the hot-pressing technique is 3.12-3.22g/cm3. Mohs hardness (99.5), Vickers hardness (2200) and microhardness (32220MPa) are all 99.5. The melting point of the metal is 1900 when it is under pressure. It typically decomposes around 1900 at atmospheric pressure. Specific heat capacity is 0.71J/g*K. The heat of forming is -751.57kJ/mol. The thermal conductivity of the material is (2-155) W/(m*K). The linear expansion coefficient is 2.8~3.2×10-6/(20~1000).
Water insoluble. Insoluble in water. The temperature at which oxygenation starts in the air is 1300-1400. The specific volume resistance of the air is 1.4×105 *m for 20 and 4×108*m for 500. The elastic modulus measures 2842046060MPa. The reaction sintering compressive strength is 490MPa. It reacts with dicalcium dialyzide at 1285 to form calcium diazide. At 600, it is reduced to a transition metal and released nitrogen oxides. The bending strength of the silicon halide is 147 MPa. It can be made by heating silica powder in nitrogen, or reacting with ammonia to make silicon halide. The resistance is between 1015-1016O.cm. It can be used in high-temperature ceramic materials.
Other than hydrofluoric acid or hot phosphoric acid silicon nitride doesn’t react with any inorganic acid and is highly resistant to corrosion.
|Silicon Nitride Si3N4 Powder Properties|
|Other names||silicon (IV), nitride|
|Appearance||From white powder to gray powder|
|Solubility of H2O||Insoluble|
Silicon Nitride Si3N4 Pulverization
High thermal stability, high oxidation resistance and high dimensional accuracy are some of the benefits of silicon nitride clay material. The covalent compound silicon nitride has a high bond strength and will form an oxygen film in the atmosphere, which gives it excellent chemical stability. Silicon nitride can not be oxidized below 1200. A protective film can also be formed between 1200 and 1600 to stop further oxidation. Silicon nitride does not become infiltrated, corroded, or infiltrated with aluminum, lead or tin, silver or brass, as well as many other molten alloys and metals. However it can be corroded and contaminated by magnesium, nickelchromium alloys, stainless steel, and other liquids.
Silicon nitride ceramic materials are suitable for use in
high-temperature engineering components
Advanced refractory for the metallurgical sector
Sealing components in the chemical, machining, and cutting industries.
Silicon nitride is a strong bond material that forms with silicon carbide (alumina), thorium oxide, boron and nitride, among others.
Additionally, silicon nitride may be used in
. After the silicon-nitride nitride is plated with the PECVD process, it can be used to reduce incident light reflections. In the deposition process for a silicon Nitride film, the hydrogen atom from the reaction product enters silicon nitride wafer and silicon nitride movie, serving as a passivation defect. The ratio of silicon nitrogen atoms to silicon nitride is not strictly 4:3. It fluctuates according to technological conditions. Different atomic proportions correspond to different physical characteristics of the film.
You can also use it in
Ultra-high temperatures gas turbines, aircraft engines and electric furnaces
Main supplier of Silicon Nitride Powder Si3N4
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Silica nitride Si3N4 granules
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