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Zinc Nitride: Overview Its chemical formula is Zn3N2, gray crystalline, soluble with hydrochloric Acid. In cold water it decomposes quickly into zinc hydroxide, ammonia. It can be produced by reacting ammonia with zinc powder at 500-600degC.
Useful Information The following are some examples of how to use Zinc Nitride

Zinc nitride film is prepared using this product
Zinc Nitride (Zn3N2) is a unique material with electrical and optical properties. The energy band gaps of zinc oxide, whether an indirect or direct band gap silicon, have always been the source of controversy in semiconductors. The band gap can be greatly affected by the preparation methods, growth conditions and problems in industry and academia. As an example, prior art methods like magnetron deposition, chemical vapour deposition, electrostatic elctrostalysis, and molecular beam epitaxy are used to create zinc nitride layers.

Zinc oxide films made by the same technique have very different optical and electric properties. A simple, easy to reproduce and high-quality crystalline preparation method is urgently needed. A method is presented for the preparation of a zinc-nitride layer. The preparation method uses atomic layer deposition to prepare the Zinc Nitride film. This allows for precise control of the band gaps in the Zinc Nitride film. The prepared membrane is uniform, complete, and has excellent performance.

The following technical solutions were adopted:

Steps for the preparation of zinc nitride films include:

1) Place the substrate inside the reaction chamber.

(2) Adsorb the zinc atoms from the zinc-containing pre-deposition source on the surface substrate by placing it in the reaction chamber of your atomic layer deposition machine.

The nitrogen-containing pre-source is then allowed to enter the reaction chamber in the atomic-layer deposition equipment. Plasma ionization of the nitrogen-containing pre-source will be performed. After ionization of the precursor source, the nitrogen is partially deposited on the substrate to form the covalent nitrogen-zinc bond. Ionization of the nitrogen precursor. The source will be sent to the equipment for atomic layer deposition. After ionization the nitrogen atoms are partially deposited in the cavity. The zinc atom is bonded to the nitrogen atom by a covalent bond.

(4) Repeat step (2) and (3) for each layer of the zinc-nitride coating.

This is an easy-to-implement method that can produce high quality crystals. It is also a repeatable method of preparation. The nitrogen is introduced to the atomic layer system via the plasma. After that, the conditions of the chamber are adjusted, including the vacuum, the cycle time, the conditions for the plasma and the temperature. Adjust the band-gap of the zinc nitride prepared film. The present invention provides various high quality zinc nitride sheets with adjustable bands gaps that can be tailored to meet different electrical and optical requirements.

2. Useful for preparing a touch screen screen cover and film.
As technology advances and smart devices become more common, the demand for touch screens to be the main interface for human-computer interactions is increasing. In the prior art, the low coating yield and high production costs, as well as the low production efficiency, were problems when the light-shielding layers in the BM of the cover of the touchscreen was prepared by screen printing with black ink. When used with liquid crystal displays, it is easy to create bubbles. Also, the product cannot be fitted perfectly. Offer a zinc nitride-based touch screen and touchscreen cover film.
The new touch screen film is made of zinc nitride as the functional layer. Zinc nitride has a low surface reflectivity, low production cost, high surface hardness with strong scratch resistance, wear resistance, high surface energy and can effectively be laminated liquid-crystal display. The thickness is 60200nm and can eliminate step effect. The new type is a touch-screen cover film that includes a Zn3N2 film and a Si3N4 film. The adhesion of a film decreases if its thickness exceeds 50 nm. If it’s less than 10 nm thick, then the film transmits light and does not have the light-tightness effect. The zinc film is black, absorbs visible light well, and has a matte finish. It can be used to create a functional black layer. The touch-screen cover film embodiment comprises in order a silicon (Si3N4) nitride, a zinc nitride, and a plastic protective film. The touch-screen cover in this embodiment consists of a glass substrate, the aforementioned screen cover film and the zinc nitride of the screen cover film.

(aka. Technology Co. Ltd., a global chemical material manufacturer and supplier with more than 12 years of experience in providing high-quality Nanomaterials and chemicals. Currently, we have developed a variety of materials. Our zinc nitride is produced with high purity, small particles and low impurity. Please send us an e-mail or click the desired products to Sending an inquiry .

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